Compensation of the tool influence function changes under neighborhood effect in atmospheric pressure plasma processing

Abstract

Nowadays, computer controlled optical surfacing (CCOS) is greatly developed in the fabrication of ultra-precision optical surfaces. As one of the deterministic CCOS techniques, atmospheric pressure plasma processing (APPP) can achieve the efficient removal based on the chemical reaction. In this process, the temperature rising issue caused by plasma heating is of great importance for accelerating the etching rate, but also increases the difficulty of deterministic removal control, because the tool influence function (TIF) in APPP is no longer time-invariant. In the existing research, the time-variant TIF model can describe the TIF changes to a certain degree, which is considered in the dwell time calculation. However, there inevitably exists the strong neighborhood effect, which indicates that the TIFs of different dwell points are thermally interacted. Thus, the existing time-variant TIF model is no longer accurate for predicting TIF changes, and not suitable for application to further compensation. To solve this, the compensation of TIF changes under neighborhood effect is proposed in this paper. First, the mechanism of TIF changes caused by neighborhood effect is explained in depth. Then, the theoretical analysis is implemented and the compensation method is systematically discussed, encompassing the tool path optimization, model of TIF changes and dwell time calculation. Further, the proposed method is demonstrated and verified by a series of simulations. Finally, the experimental validation is carried out, which proves the capability of achieving high-precision removal and high convergence rate.