Affiliation:
1. Chinese Academy of Sciences
2. Institute of Microelectronics of Chinese Academy of Sciences
3. University of Chinese Academy of Sciences
Abstract
For X-ray reflective optics that work based on the concept of total external reflection, coating the reflector surface with high-density film is a common idea to enhance performance. Atomic layer deposition (ALD) has been proven to be a promising way to coat the reflector surface with a large curvature, even the inner surface of an X-ray capillary. In this paper,
H
f
O
2
and iridium films were prepared on flat silicon and glass substrates via ALD, and X-ray reflectivity (XRR) was used as a main tool to investigate the effect of film properties on the total reflection performance.
Funder
National Natural Science Foundation of China
Institute of Electrical Engineering, Chinese Academy of Sciences
Chinese Academy of Sciences
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献