Layer-by-layer design method for multilayers with barrier layers: application to Si/Mo multilayers for extreme-ultraviolet lithography
Author:
Publisher
The Optical Society
Subject
Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. New layer-by-layer multilayer design method
2. Layer-by-layer design method for soft-x-ray multilayers
3. EIT: Extreme-ultraviolet Imaging Telescope for the SOHO mission
4. Normal incidence multilayer telescope for galactic EUV observation
5. Thermally induced structural modification of Mo‐Si multilayers
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