Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors-Reference-Cited by-同舟云学术

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Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors

Published:2012-12-13 Issue:36 Volume:51 Page:8541
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Bosgra Jeroen,Zoethout Erwin,van der Eerden Ad M. J.,Verhoeven Jan,van de Kruijs Robbert W. E.,Yakshin Andrey E.,Bijkerk Fred

Funder

SenterNovem

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference19 articles.

1. Nanometer interface and materials control for multilayer EUV-optical applications

2. Soft X-Ray Optics

3. General theory of sub-quarterwave multilayers with highly absorbing materials

4. Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity

5. Sub-quarterwave multilayers with enhanced reflectance at 13.4 and 11.3 nm

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1. The development of laser-produced plasma EUV light source;Chip;2022-09

2. Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications;Applied Surface Science;2020-03

3. Precision in harsh environments;Microsystems & Nanoengineering;2016-10-10

4. High-reflectance La/B-based multilayer mirror for 6x nm wavelength;Optics Letters;2015-08-07

5. Phosphorus-based compounds for EUV multilayer optics materials;Optical Materials Express;2015-05-26

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