Developing new manufacturing methods for the improvement of AlF_3 thin films
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference10 articles.
1. Development of optical coatings for 157-nm lithography I Coating materials
2. Vacuum ultraviolet loss in magnesium fluoride films
3. Materials for optical coatings in the ultraviolet
4. Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography
5. Process for deposition of AlF_3 thin films
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2. Aluminum oxyfluoride films for deep ultraviolet optics deposited by a combined HIPIMS/CFUBMS deposition technique;Optical Materials Express;2016-04-06
3. Comparison of the Biological Impacts of the Fluoride Compounds by Graphical Risk Visualization Map Technique;Biological Trace Element Research;2015-03-08
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