Author:
Yang Yun-Cheng,Wan Zeyu,Chiu Chih-Chuan,Chen Wei-Hsin,Hsu Guei-Ting,Feifel Markus,Lackner David,Xia Guangrui(Maggie),Wu Chao-Hsin
Abstract
This achievement marks a major milestone, establishing a dedicated pathway for epitaxy and fabrication of high-speed Ge-VCSELs. This technology offers extensive insights into epitaxial processes, advancing the field of VCSEL development.