Plasmonic direct-writing lithography via high numerical aperture objectives

Abstract

The exploration of light–matter interactions at the sub-wavelength scale requires advanced nano-patterning tools with low cost and high flexibility. Plasmonic lithography as a promising candidate receives much attention owing to its ability to confine ultraviolet light sources into an extremely tiny volume. To date, most plasmonic patterning schemes utilize metallic nano-structures to achieve tight focusing. The drawback is that the plasmonic structures need, however, to be pre-defined, usually accompanied with the expense of complex fabrication processes. Here we numerically and experimentally report an antenna-free plasmonic lithography technique using high numerical aperture (NA) objectives as the scanning head. Minimum feature sizes of 0.36λ/NA and 0.46λ/NA are numerically and experimentally demonstrated, respectively, under the linearly polarized continuous-wave illumination at 457 nm with no involvement of nonlinear effects. Back-focal-plane imaging is used to visualize surface-plasmon excitations, acting as a viable way of adjusting focus precisely. Our method can serve as a candidate for laser processing at the sub-wavelength scale, and offers a truly convenient and economical way of nano-patterning.