Recovery of multilayer-coated Zerodur and ULE optics for extreme-ultraviolet lithography by recoating, reactive-ion etching, and wet-chemical processes-Reference-Cited by-同舟云学术

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Recovery of multilayer-coated Zerodur and ULE optics for extreme-ultraviolet lithography by recoating, reactive-ion etching, and wet-chemical processes

Published:2001-01-01 Issue:1 Volume:40 Page:62
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Mirkarimi Paul B.,Baker Sherry L.,Montcalm Claude,Folta James A.

Publisher

The Optical Society

Reference10 articles.

1. Extreme ultraviolet lithography

2. Extreme ultraviolet lithography

3. Multilayer x‐ray mirrors: Interfacial roughness, scattering, and image quality

4. Multilayer mirror technology for soft-x-ray projection lithography

5. Surface finish requirements for soft x-ray mirrors

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical dispersion and bandgap of ultralow expansion glass;Optical Engineering;2023-03-06

2. Temperature-dependent UV transparency of ultra-low expansion ULE glass;Advanced Optics for Imaging Applications: UV through LWIR VII;2022-05-27

3. Microscopic morphology evolution during ion beam smoothing of Zerodur^® surfaces;Optics Express;2014-01-02

4. Etching blazed grating into quartz substrate with selectivity 1:1 against photoresist by inductively coupled plasma technology;Optik;2011-03

5. Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics;Optical Engineering;2008-06-01

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