Robust hybrid source and mask optimization to lithography source blur and flare
Author:
Publisher
The Optical Society
Reference29 articles.
1. Optimum mask and source patterns to print a given shape
2. Source optimization for image fidelity and throughput
3. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography
4. Gradient-Based Source and Mask Optimization in Optical Lithography
5. Gradient-based fast source mask optimization (SMO)
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