Abstract
Wrapped writing mode is a simple, inexpensive approach to multiphoton stereolithography. Standard ∼10 µm thin cling foil shields the objective from direct contact with the photoresist, without compromising writing resolution. A diffraction limited lateral voxel width below 150 nm was demonstrated through ray tracing simulations and electron microscopy using standard polymer photoresist. Wrapped mode, like dip-in printing, is not limited by the objective working distance height. Its utility to prototype new print resists was validated through custom aqueous protein, silver nitrate, and black epoxy based formulations.
Funder
Deutsche Forschungsgemeinschaft
Vector Stiftung
Ministerium für Wissenschaft, Forschung und Kunst Baden-Württemberg
European Research Council
Baden-Württemberg Stiftung
Bundesministerium für Bildung und Forschung
Subject
Electronic, Optical and Magnetic Materials
Cited by
6 articles.
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