Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference20 articles.
1. Techniques for measuring aberrations in lenses used in photolithography with printed patterns
2. Aberration measurement from specific photolithographic images: a different approach
3. Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks
4. Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools
5. Understanding lens aberration and influences to lithographic imaging
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Image based method for aberration measurement of lithographic tools;2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology;2018-01-12
2. Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography;Applied Optics;2015-06-04
3. Inverse pupil wavefront optimization for immersion lithography;Applied Optics;2014-10-09
4. Aberration measurement based on principal component analysis of aerial images of optimized marks;Optics Communications;2014-10
5. Aberration measurement technique based on an analytical linear model of a through-focus aerial image;Optics Express;2014-03-04
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3