Varying stress of SiO_xC_y thin films deposited by plasma polymerization
Author:
Funder
Ministry of Science and Technology, Taiwan (MOST)
Publisher
The Optical Society
Reference27 articles.
1. X. On the properties of electro-deposited antimony
2. Stress reduction and bond stability during thermal annealing of tetrahedral amorphous carbon
3. Stress reduction in ion beam sputtered mixed oxide films
4. Microwave assisted HMDSO/oxygen plasma coated polyethylene terephthalate films: Effects of process parameters and uniaxial strain on gas barrier properties, surface morphology, and chemical composition
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2. SiO2-like film deposited by plasma polymerization of HMDSO + O2 using repetitive high voltage pulses;Journal of Coatings Technology and Research;2020-07-15
3. SiOx:C/SiO2-like gas barrier multilayer thin films deposited by radio frequency magnetron sputtering-based plasma polymerization system;Thin Solid Films;2018-08
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