Affiliation:
1. Beijing Institute of Technology
2. National Institute of Metrology (NIM)
3. Wuhan National Laboratory for Optoelectronics
Abstract
Antireflective microstructures fabricated using femtosecond laser possess wide-ranging applicability and high stability across different spectral bands. However, due to the limited aspect ratio of the focused light field, traditional femtosecond laser manufacturing faces challenges in efficiently fabricating antireflective microstructures with high aspect ratio and small period, which are essential for antireflection, on curved surfaces. In this study, we present a robust and efficient method for fabricating high-aspect-ratio and basal surface insensitive antireflective microstructures using a spatially shaped Bessel-like beam. Based on theoretical simulation, a redesigned telescopic system is proposed to flexibly equalize the intensity of the Bessel beam along its propagation direction, facilitating the fabrication of antireflective subwavelength structures on the entire convex lens. The fabricated microstructures, featuring a width of less than 2 µm and a depth of 1 µm, enhance transmittance from 75% to 85% on Diamond-ZnS composite material (D-ZnS) surfaces. Our approach enables the creation of high aspect ratio subwavelength structures with a z-position difference exceeding 600 µm. This practical, efficient, and cost-effective method is facilitated for producing antireflective surfaces on aero-optical components utilized in aviation.
Funder
National Key Research and Development Program of China
Beijing Outstanding Young Scientist Program
National Natural Science Foundation of China
Beijing Municipal Natural Science Foundation
Joint Funds of the National Natural Science Foundation of China
Chongqing Natural Science Foundation of China
Wuhan National Laboratory for Optoelectronics
Subject
Atomic and Molecular Physics, and Optics