Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers-Reference-Cited by-同舟云学术

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Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers

Published:2016-04-08 Issue:11 Volume:55 Page:3017
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Ye Hui,Li Yaguo,Zhang Qinghua,Wang Wei,Yuan Zhigang,Wang Jian,Xu Qiao

Funder

National Natural Science Foundation of China (NSFC)

Foundation for the Development of Science and Technology of China Academy of Engineering Physics

Foundation of Key Laboratory for Ultra-Precision Manufacturing of China Academy of Engineering Physics

Open Research Foundation of State Key Laboratory of Digital Manufacturing Equipment and Technology in Huazhong University of Science and Technology

Publisher

The Optical Society

Reference30 articles.

1. High fluence laser damage precursors and their mitigation in fused silica

2. Subsurface damage and polishing compound affect the 355-nm laser damage threshold of fused silica surfaces

3. Producing fused silica optics with high UV-damage resistance to nanosecond pulsed lasers

4. Laser-induced damage of fused silica at 355 and 1064 nm initiated at aluminum contamination particles on the surface

5. Defects induced in fused silica by high fluence ultraviolet laser pulses at 355 nm

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2. Experimental Study on Evolution of Chemical Structure Defects and Secondary Contaminative Deposition during HF-Based Etching;Photonics;2024-05-20

3. Research on the mitigation of redeposition defects on the fused silica surface during wet etching process;Optics Express;2024-02-26

4. Influence of Thermal Annealing on Mechanical and Optical Property of SiO2 Film Produced by ALD;Materials;2024-01-19

5. Effect of organic pollution on surface quality and laser damage in fused silica;Pacific-Rim Laser Damage 2023: Optical Materials for High-Power Lasers;2023-12-23

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