Reverse engineering of e-beam deposited optical filters based on multi-sample photometric and ellipsometric data

Author:

Amotchkina Tatiana1,Trubetskov Michael12ORCID,Janicki Vesna3,Sancho-Parramon Jordi3

Affiliation:

1. Optilayer GmbH

2. Max-Planck Institute of Quantum Optics

3. Ruđer Bošković Institute

Abstract

A post-production characterization approach based on spectral photometric and ellipsometric data related to a specially prepared set of samples is proposed. Single-layer (SL) and multilayer (ML) sets of samples presenting building blocks of the final sample were measured ex-situ, and reliable thicknesses and refractive indices of the final ML were determined. Different characterization strategies based on ex-situ measurements of the final ML sample were tried, reliability of their results was compared, and the best characterization approach for practical use, when preparation of the mentioned set of samples would be a luxury, is proposed.

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Semiconductor Multilayer Nanometrology with Machine Learning;Nanomanufacturing and Metrology;2023-05-04

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