Process variation in silicon photonic devices-Reference-Cited by-同舟云学术

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Process variation in silicon photonic devices

Published:2013-10-31 Issue:31 Volume:52 Page:7638
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Chen Xi,Mohamed Moustafa,Li Zheng,Shang Li,Mickelson Alan R.

Funder

Directorate for Computer and Information Science and Engineering (CISE)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference29 articles.

1. Nanoelectronic and Nanophotonic Interconnect

2. Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology

3. Silicon photonics manufacturing

4. Addressing system-level trimming issues in on-chip nanophotonic networks;Nitta,2011

5. Wavelength tracking with thermally controlled silicon resonators

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1. Towards Efficient On-Chip Communication: A Survey on Silicon Nanophotonics and Optical Networks-on-Chip;Journal of Systems Architecture;2024-07

2. Few-Shot Bayesian Performance Modeling for Silicon Photonic Devices Under Process Variation;Journal of Lightwave Technology;2023-09-15

3. Evaluating Variability and Improving Tolerance in a Novel and Compact Silicon Photonic Michelson Interferometer;Silicon;2022-02-12

4. Universal Method for Constructing Fault-Tolerant Optical Routers Using RRW;Wireless Communications and Mobile Computing;2021-08-17

5. Post-fabrication resonance trimming of Si3N4 photonic circuits via localized thermal annealing of a sputter-deposited SiO2 cladding;Optical Materials Express;2021-07-07

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