Wavefront aberration compensation of projection lens using clocking lens elements-Reference-Cited by-同舟云学术

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Wavefront aberration compensation of projection lens using clocking lens elements

Published:2013-07-24 Issue:22 Volume:52 Page:5398
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Liu ChunLai,Huang Wei,Shi Zhenguang,Xu Weicai

Funder

National Science and Technology Major Project of China

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference5 articles.

1. Improving lens performance through the most recent lens manufacturing process

2. Realization of very small aberration projection lenses

3. Measurement Error Analysis of High Precision Fizeau Interferometer for Lithography Projection Objective

4. 《光学学报》创刊三十周年

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1. Identification of key aberrations that affect pattern imaging in EUVL;DTCO and Computational Patterning III;2024-04-10

2. Method for compensation selection of a microlithographic optical system;Applied Optics;2020-05-14

3. In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method;Applied Optics;2019-05-20

4. Tolerance analysis of hyper numerical aperture lithography objective with freeform surfaces;Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018);2018-07-24

5. Global optimization method based on ray tracing to achieve optimum figure error compensation;SPIE Proceedings;2017-02-28

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