NbC/Si multilayer mirror for next generation EUV light sources
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference16 articles.
1. Non-destructive X-ray study of the interphases in Mo/Si and Mo/B4C/Si/B4C multilayers
2. The FERMI@Elettra free-electron-laser source for coherent x-ray physics: photon properties, beam transport system and applications
3. Operation of a free-electron laser from the extreme ultraviolet to the water window
4. Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure
5. Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source
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