In situ UV nano-imprint lithography alignment using high contrast mark-Reference-Cited by-同舟云学术

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In situ UV nano-imprint lithography alignment using high contrast mark

Published:2015-07-08 Issue:14 Volume:23 Page:18518
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Qin Jin,Ding Li,Wang Liang

Funder

Anhui Provincial Natural Science Foundation

University of Science and Technology of China

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference12 articles.

1. Controlling Plasmon Line Shapes through Diffractive Coupling in Linear Arrays of Cylindrical Nanoparticles Fabricated by Electron Beam Lithography

2. X-ray lithography

3. Recent developments in micromilling using focused ion beam technology

4. Extreme ultraviolet lithography

5. Imprint of sub‐25 nm vias and trenches in polymers

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Large-range lithography nano-alignment without phase unwrapping by a dual-frequency moiré fringe heterodyne;Optics Letters;2023-10-16

2. Lithography Alignment Techniques Based on Moiré Fringe;Photonics;2023-03-23

3. Fluorescence imprint alignment using additive-type inclination moiré fringes;Japanese Journal of Applied Physics;2020-03-09

4. Nano- and microstructured materials for in vitro studies of the physiology of vascular cells;Beilstein Journal of Nanotechnology;2016-11-08

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