Aperiodic multilayers with enhanced reflectivity for extreme ultraviolet lithography
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Publisher
The Optical Society
Reference17 articles.
1. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography
2. Environmental data from the engineering test stand
3. Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
4. Radio-frequency discharge cleaning of silicon-capped Mo/Si multilayer extreme ultraviolet optics
5. Design and performance of capping layers for EUV multilayer mirrors
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