Author:
Yamakoshi Yoshiki,Atoda Nobufumi,Shimizu Keizo,Sato Takuso,Shimizu Yukiharu
Cited by
7 articles.
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1. Proximity X-ray and extreme ultraviolet lithography;Comptes Rendus de l'Académie des Sciences - Series IV - Physics;2000-09
2. Extendibility of synchrotron radiation lithography to the sub-100 nm region;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11
3. Fabrication of 0.2 μm large scale integrated circuits using synchrotron radiation x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11
4. X-Ray Phase-Shifting Mask for 0.1-µm Pattern Replication under a Large Proximity Gap Condition;Japanese Journal of Applied Physics;1992-12-30
5. Electromagnetic calculation of soft x-ray diffraction from 0.1-μm scale gold structures;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-11