Sputtering AlN/InxAl1−xN distributed Bragg reflector across the full visible range on Si and SiO2 substrates
Author:
Funder
National Key Research and Development Program of China
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference20 articles.
1. Band gap bowing and refractive index spectra of polycrystalline AlxIn1−xN films deposited by sputtering
2. Three-dimensional metal–semiconductor–metal AlN deep-ultraviolet detector
3. Optical and structural characterization of AlInN layers for optoelectronic applications
4. Resonant cavity light‐emitting diode
5. Effects of indium mole fraction on the physical characteristics of magnetron sputtered InxAl1−xN films
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