Relative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al2O3 layers-Reference-Cited by-同舟云学术

Relative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al2O3 layers

Published:2020-05-27 Issue:6 Volume:10 Page:1451
ISSN:2159-3930
Container-title:Optical Materials Express
language:en
Short-container-title:Opt. Mater. Express

Author:

van Emmerik Carlijn I.^ORCID,Hendriks Ward A. P. M.,Stok Martijn M.,de Goede Michiel,Chang Lantian,Dijkstra Meindert,Segerink Frans,Post Dominic,Keim Enrico G.,Dikkers Mike J.,García-Blanco Sonia M.^ORCID

Funder

European Research Council

Stichting voor de Technische Wetenschappen

Publisher

The Optical Society

Subject

Electronic, Optical and Magnetic Materials

Reference77 articles.

1. Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

2. Sputter deposition of crystalline alumina coatings

3. Pulsed DC magnetron sputtered Al2O3 films and their hardness

4. Tribological and optical properties of crystalline and amorphous alumina thin films grown by low-temperature reactive magnetron sputter-deposition

5. Tunable, continuous-wave Ti:sapphire channel waveguide lasers written by femtosecond and picosecond laser pulses

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