Center wavelength shift dependence on substrate coefficient of thermal expansion for optical thin-film interference filters deposited by ion-beam sputtering-Reference-Cited by-同舟云学术

Center wavelength shift dependence on substrate coefficient of thermal expansion for optical thin-film interference filters deposited by ion-beam sputtering

Published:2004-08-10 Issue:23 Volume:43 Page:4506
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Brown Jeffrey T.

Publisher

The Optical Society

Reference6 articles.

1. Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition

2. Characterization of high-K dielectric ZrO[sub 2] films annealed by rapid thermal processing

3. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region

4. The effective medium approximations: Some recent developments

5. Optical, mechanical and thermal properties of MgF₂-ZnS and MgF₂-Ta₂O₅ composite thin films deposited by coevaporation

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