Sub-100 nm photolithography using TE-polarized waves in transparent nanostructures
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference10 articles.
1. Imprint of sub‐25 nm vias and trenches in polymers
2. Surface plasmon resonant interference nanolithography technique
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5. Subwavelength focusing in the near field in mesoscale air–dielectric structures
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