Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas-Reference-Cited by-同舟云学术

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Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas

Published:2007-03-19 Issue:8 Volume:32 Page:997
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

George Simi A.,Silfvast William T.,Takenoshita Kazutoshi,Bernath Robert T.,Koay Chiew-Seng,Shimkaveg Gregory,Richardson Martin C.

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference11 articles.

1. Extreme ultraviolet lithography

2. Intense EUV incoherent plasma sources for EUV lithography and other applications

3. Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography

4. Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

5. High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

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1. Science challenges and research opportunities for plasma applications in microelectronics;Journal of Vacuum Science & Technology B;2024-06-03

2. Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review);Journal of Optics;2022-04-22

3. Spectroscopic Studies of Laser-Based Far-Ultraviolet Plasma Light Source;Applied Sciences;2021-07-27

4. Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser;Optics Express;2021-01-28

5. Calculation of the extreme-ultraviolet radiation conversion efficiency for a laser-produced tin plasma source;Physics Open;2019-12

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