Author:
Tichenor D. A.,Ray-Chaudhuri A. K.,Kubiak G. D.,Nguyen K. B.,Haney S. J.,Berger K. W.,Nissen R. P.,Perras Y. E.,Jin P. S.,Weingarten L. I.,Keifer P. N.,Stulen R. H.,Shagam R. N.,Sweatt W. C.,Smith T. G.,Wood O. R.,MacDowell A. A.,Bjorkholm J. E.,Jewell T. E.,Zernike F.,Fix B. L.,Hauschildt H. W.
Abstract
An extreme ultraviolet (EUV) ring-field camera, comprised of 3 aspheric mirrors, has been fabricated and evaluated using visible light. The wavefront error (WFE) within a 1 mm × 25 mm field of view is 2.5 nm RMS. In a 10x Schwarzschild optic, having a 0.4 mm diameter field of view, an optically measured WFE of 1 nm RMS has been achieved. EUV images recorded in resist using the Schwarzschild camera are shown. The integration of this camera into a laboratory tool for device fabrication experiments is described.
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1 articles.
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