Selective reflection technique as a probe to monitor the growth of metallic thin film on dielectric surfaces-Reference-Cited by-同舟云学术

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Selective reflection technique as a probe to monitor the growth of metallic thin film on dielectric surfaces

Published:2013-08-20 Issue:24 Volume:52 Page:6074
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Martins Weliton Soares,Oriá Marcos,Chevrollier Martine,de Silans Thierry Passerat

Funder

Conselho Nacional de Desenvolvimento Científico e Tecnológico

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES/Pró-equipamentos)

Financiadora de Estudos e Projetos (FINEP)

CNPq

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference31 articles.

1. 10‐nm linewidth electron beam lithography on GaAs

2. Fabrication of 5–7 nm wide etched lines in silicon using 100 keV electron‐beam lithography and polymethylmethacrylate resist

3. Lift‐off lithography using an atomic force microscope

4. Controlling Cold Atoms using Nanofabricated Surfaces: Atom Chips

5. Matter-wave interferometry in a double well on an atom chip

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. INFLUENCIA DE LAS COLISIONES ATÓMICAS EN LAS RESONANCIAS SUB-DOPPLER DE LA ESPECTROSCOPIA DE REFLEXIÓN SELECTIVA EN LA LÍNEA D2 DEL CESIO;MOMENTO;2018-07-01

2. Bulk characterization in a Monte Carlo particle-deposition model with a novel adherence-potential barrier;Journal of Applied Physics;2016-07-21

3. Selective reflection of light from Rb2 molecular vapor;Journal of Molecular Spectroscopy;2015-07

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