Stable 10,000-hour operation of 20-W deep ultraviolet laser generation at 266 nm

Author:

Orii Yosuke12,Kohno Kenta1,Tanaka Hiroki1,Yoshimura Masashi2,Mori Yusuke2,Nishimae Junichi3,Shibuya Kimihiko1

Affiliation:

1. Spectronix

2. Osaka University

3. Advanced Technology R & D Center, Mitsubishi Electric Corporation

Abstract

We report 10,000-hour stable operation of a 266-nm picosecond laser with an average power of 20 W. We have developed a narrow-linewidth, high-peak-power 1064-nm laser source with a repetition rate of 600 kHz, an average power of 129 W, a linewidth of 0.15 nm, and a pulse duration of 14 ps using a gain-switched DFB-LD as a picosecond pulse seed source and a four-stage power amplifier with an Nd:YVO4 crystal. A 266-nm laser with a maximum average power of 25.4 W was generated by frequency conversion using LBO and CLBO crystals and had a pulse duration of 8 ps and beam quality factor of 1.5 at 20W. To the best of our knowledge, we also demonstrated that the average power and the beam quality can be maintained for 10,000 hours for the first time. We have confirmed the durability of the developed deep ultraviolet laser for industrial applications.

Funder

New Energy and Industrial Technology Development Organization

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics

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