Coherent scattering microscopy as an effective inspection tool for analyzing performance of phase shift mask
Author:
Funder
National Research Foundation of Korea (NRF)
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference29 articles.
1. Viability of pattern shift for defect-free EUV photomasks at the 7nm node
2. High-throughput parallel SPM for metrology, defect, and mask inspection
3. Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography
4. Actinic characterization of extreme ultraviolet bump-type phase defects
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