Affiliation:
1. National University of Defense Technology
2. Hunan Key Laboratory of Ultra-Precision Machining Technology
3. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
Abstract
In view of the problems of large surface roughness and low removal efficiency caused by the existing sapphire processing process, a combined polishing process based on temperature control computer controlled optical surfacing-magnetic rheology is proposed. The polishing removal mechanism of sapphire material polishing and the law of processing surface roughness change are studied. The optimal process parameters are obtained by designing the orthogonal experiments. Under this parameter, a sapphire aspherical component with good surface quality is obtained, and the temperature has a significant amount of influence on the removal efficiency. Finally, the optimum temperature of sapphire material under magnetorheological polishing was determined to be 75°C. The results greatly improve the manufacturing efficiency of high sapphire surface quality.
Funder
National Key Research and Development Program of China
National Natural Science Foundation of China
Natural Science Foundation of Hunan Province
Science and Technology Innovation Program of Hunan Province
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
Cited by
2 articles.
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