Author:
La Fontaine B.,Gaines D. P.,Kania D. R.,Sommargren G. E.,Baker S. L.,Ciarlo D.
Abstract
The performance of an Extreme Ultraviolet Lithography (EUVL) imaging optic was characterized by printing resolution test images in resist. While features as small as 0.137µm were successfuly printed, a resolution of 0.175µm better represents the performance of the system over the full 0.9mm2 image field. The contrast of the aerial image was estimated to be approximately 40% or less for the fine features printed. This low contrast value is attributed to a degradation of the modulation transfer function (MTF) due to the presence of scattered light in the image.