Amplitude and phase beam shaping for highest sensitivity in sidewall angle detection
Author:
Publisher
The Optical Society
Subject
Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference18 articles.
1. Optically monitoring and controlling nanoscale topography during semiconductor etching
2. Technology and metrology of new electronic materials and devices
3. Side-Wall Measurement using Tilt-Scanning Method in Atomic Force Microscope
4. Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM
5. Profiles of a high-aspect-ratio grating determined by spectroscopic scatterometry and atomic-force microscopy
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Optimal parameter estimation of shaped phase objects;Physical Review A;2024-03-21
2. Analysis for system errors in measuring the sidewall angle of a silica waveguide with confocal laser scanning microscope (CLSM);Measurement Science and Technology;2019-01-04
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