Line-shaped laser lithography for efficient fabrication of large-area subwavelength nanogratings

Author:

Xu Kang1ORCID,Huang Lingyu1,Xu Shaolin1ORCID

Affiliation:

1. Southern University of Science and Technology

Abstract

Subwavelength nanogratings for optical modulation have attracted significant attention for efficient large-area fabrication. We developed a far-field laser nanofabrication method, called line-shaped laser lithography, to ablate thin films with separated line-shaped ultrafast laser pulses on substrates into multiple nanogratings. The millimeter pulse length and high-speed scanning for a single-pulse ablation ensure exceptionally high large-area fabrication efficiency. Moreover, nanogratings with a sub-100 nm linewidth (e.g., a 57 nm linewidth ( λ / 9 ) nanograting on 10 nm Au film) were generated based on the Marangoni effect. An ultra-uniform large-area ( 6 × 15 m m 2 ) nanograting with a width of 132 nm and a length-to-width ratio of 45 , 500 was achieved in only 1.5 s. In particular, diversified nanogratings can be obtained by designing scanning strategies, including moiré, blaze-like, Dammann, and 2D nanogratings, revealing light modulations in diffraction and beam splitting.

Funder

Guangdong Provincial University Science and Technology Program

Shenzhen Science and Technology Program

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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