Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference23 articles.
1. Understanding lens aberration and influences to lithographic imaging
2. Techniques for measuring aberrations in lenses used in photolithography with printed patterns
3. Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks
4. Beugungstheorie des schneidenver-fahrens und seiner verbesserten form, der phasenkontrastmethode
5. Aerial image measurement methods for fast aberration set-up and illumination pupil verification
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1. Rigorous imaging-based measurement method of polarization aberration in hyper-numerical aperture projection optics;Optics Express;2021-06-17
2. Fast reconstruction of the aberrated scanning lithographic image by a quadratic imaging model and an integral transfer function;Applied Optics;2020-05-18
3. Integral-based parallel algorithm for the fast generation of the Zernike polynomials;Optics Express;2020-01-06
4. A nonlinear measurement method of polarization aberration in immersion projection optics by spectrum analysis of aerial image;Optics Express;2018-11-28
5. Separation of variables based method for fast calculation of imaging system in lithographic tools;Tenth International Conference on Information Optics and Photonics;2018-11-15
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