Through-focus scanning optical microscopy (TSOM) considering optical aberrations: practical implementation
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference9 articles.
1. Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration
2. Scatterometry for shallow trench isolation (STI) process metrology
3. Optical critical dimension (OCD) measurments for profile monitoring and control: applications for mask inspection and fabrication
4. Comparison of measured optical image profiles of silicon lines with two different theoretical models
5. New method to enhance overlay tool performance
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