Stress analysis of ZrO_2?SiO_2 multilayers deposited on different substrates with different thickness periods
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference11 articles.
1. Variation in stress with background pressure in sputtered Mo/Si multilayer films
2. Film stress of sputtered W/C multilayers and strain relaxation upon annealing
3. Intrinsic stress in sputtered thin films
4. Interface stress of AlxGa1−xAs–GaAs layer structures
5. Interface stress in Au/Ni multilayers
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