Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance-Reference-Cited by-同舟云学术

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Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance

Published:2017-09-08 Issue:26 Volume:56 Page:7462
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Yu Bo,Jin Chunshui,Yao Shun,Li Chun,Liu Yu,Zhou Feng,Guo Benyin,Wang Hui,Xie Yao,Wang Liping

Funder

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference27 articles.

1. Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering

2. Improved reflectance and stability of Mo/Si multilayers

3. Thermal and stress studies of the 30.4nm Mo/Si multilayer mirror for the moon-based EUV camera

4. Control of surface mobility for conformal deposition of Mo–Si multilayers on saw-tooth substrates

5. Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings

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1. EFFECT OF ARGON WORKING GAS PRESSURE ON MECHANICAL STRESSES IN Mo/Si MULTILAYER X-RAY MIRRORS;Problems of Atomic Science and Technology;2024-01-29

2. 样品倾转角度对透射电镜表征纳米薄膜的影响;Acta Optica Sinica;2024

3. Study of the Reflectivity and Microstructure of Mo/Be Multilayer Mirrors;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-12

4. Study of Reflectivity and Microstructure of Mo/Be Multilayer Mirrors;Поверхность. Рентгеновские, синхротронные и нейтронные исследования;2023-12-01

5. The Fabrication of a High-Precision Rotational Symmetric Hyperboloid Mirror by Magnetron Sputtering with Film Thickness Correction;Coatings;2022-07-25

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