Affiliation:
1. Nanjing Electronic Devices Institute
2. Changshu Institute of Technology
Abstract
We report high-performance Al0.1Ga0.9N p-i-n ultraviolet (UV) avalanche photodiodes (APDs) based on sapphire substrates with stable breakdown voltages (VBR) around 113.4 V, low dark current densities (JBR) below 9 × 10−4 A/cm2 and a high avalanche gain over 2 × 106. A two-step deposition method was employed to reduce passivation-induced plasma damage while maintaining high dielectric film quality. Consistent JBR for various mesa sizes at the VBR are demonstrated, which reveals the suppression of the surface leakage current. Uniform electroluminescence (EL) distributions during the avalanche multiplication processes are displayed, which confirms the elimination of edge breakdown. Pure bulk leakage current distributions and uniform body avalanche breakdown behaviors are observed for the first time in AlGaN APDs. The emission spectra of the EL at various current levels are also presented.
Funder
National Key Research and Development Program of China
National Natural Science Foundation of China
Key R&D Project of Jiangsu
Subject
Atomic and Molecular Physics, and Optics
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献