Damage and ablation of large bandgap dielectrics induced by a 469 nm laser beam-Reference-Cited by-同舟云学术

Damage and ablation of large bandgap dielectrics induced by a 469 nm laser beam

Published:2006-01-01 Issue:1 Volume:31 Page:68
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Ritucci A.,Tomassetti G.,Reale A.,Arrizza L.,Zuppella P.,Reale L.,Palladino L.,Flora F.,Bonfigli F.,Faenov A.,Pikuz T.,Kaiser J.,Nilsen J.,Jankowski A. F.

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference14 articles.

1. Surface micromachining of UV transparent materials

2. Fabrication of submicron gratings in fused silica by F 2 -laser ablation

3. Laser ablation of dielectrics with temporally shaped femtosecond pulses

4. Surface damage threshold and structuring of dielectrics using femtosecond laser pulses: the role of incubation

5. The structure and composition of lithium fluoride films grown by off-axis pulsed laser ablation

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