Comparative study of ALD SiO_2 thin films for optical applications-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Comparative study of ALD SiO_2 thin films for optical applications

Published:2016-01-27 Issue:2 Volume:6 Page:660
ISSN:2159-3930
Container-title:Optical Materials Express
language:en
Short-container-title:Opt. Mater. Express

Author:

Pfeiffer Kristin,Shestaeva Svetlana,Bingel Astrid,Munzert Peter,Ghazaryan Lilit,van Helvoirt Cristian,Kessels Wilhelmus M. M.,Sanli Umut T.,Grévent Corinne,Schütz Gisela,Putkonen Matti,Buchanan Iain,Jensen Lars,Ristau Detlev,Tünnermann Andreas,Szeghalmi Adriana

Funder

Carl-Zeiss-Stiftung

Deutsche Forschungsgemeinschaft (DFG)

European Commission (EC)

European Space Agency (ESA)

Fraunhofer-Gesellschaft (Fraunhofer)

Friedrich Schiller University

Publisher

The Optical Society

Subject

Electronic, Optical and Magnetic Materials

Reference31 articles.

1. Characterization of SiO2 and TiO2 films prepared using rf magnetron sputtering and their application to anti-reflection coating

2. Optical coatings deposited by ion and plasma PVD processes

3. Antireflection coating design for plastic optics

4. A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

5. Introducing atomic layer epitaxy for the deposition of optical thin films

Cited by 56 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Silicon Nitride Integrated Photonics from Visible to Mid‐Infrared Spectra;Laser & Photonics Reviews;2024-07-27

2. The surface chemistry of the atomic layer deposition of metal thin films;Nanotechnology;2024-06-18

3. Influence of Thermal Annealing on Mechanical and Optical Property of SiO2 Film Produced by ALD;Materials;2024-01-19

4. Thermogravimetric study of metal–organic precursors and their suitability for hybrid molecular beam epitaxy;Journal of Materials Research;2023-12-20

5. Femtosecond laser strengthening of electron-beam deposited SiO2 thin film on fused silica substrates;Thin Solid Films;2023-09

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3