Enhanced performance in deep-ultraviolet laser diodes with an undoped BGaN electron blocking layer

Abstract

Aluminum-rich p-AlGaN electron blocking layers (EBLs) are typically used for preventing overflow of electrons from the active region in AlGaN-based deep ultraviolet (DUV) laser diode (LD). However, these cannot effectively prevent electron leakage and form barrier layers, which affects the hole injection efficiency. Herein, the traditional p-AlGaN EBL in LD is replaced with an undoped BGaN EBL. The undoped BGaN EBL LD increases the effective barrier height of the conduction band to prevent the leakage of electrons and decreases the energy loss caused by the polarization induced electric field, enhancing the hole injection. The slope efficiency of the undoped BGaN EBL LD is 289% higher than that of the highly doped AlGaN EBL LD, and its threshold current is 51% lower. Therefore, the findings of this study provide insights for solving the problems of electron leakage and insufficient hole injection in high-performance and undoped EBL DUV LDs.