Optical and geometric parameter extraction for photonic integrated circuits

Abstract

We describe an in-situ technique to characterize the material refractive indices and waveguide geometry for photonic integrated circuits over hundreds of nanometers of optical bandwidth. By combining white light spectroscopy with unbalanced Mach-Zehnder interferometers, we can simultaneously and accurately extract the core thickness, core width, core refractive index, and cladding refractive index. This information is important for the technological maturation of photonic integrated circuit foundry fabrication. Capturing the inter-wafer and intra-wafer variation of these parameters is necessary to predict the yield of photonic components and for overall process quality control. Refractive indices are found with a 1-σ error of between 0.1% and 0.5%, and geometric parameters are found with an error of between 3 nm and 7 nm. Our analysis and validation are implemented and verified using the same waveguide layers as are used in the standard photonic wafer build, without any external techniques such as ellipsometry or microscopy.