Ionized Physical Vapour Deposition combined with PECVD, for synthesis of carbon–metal nanocomposite thin films
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Reference21 articles.
1. Characterisation of the AgC:H deposition process
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1. Comparative study of titanium carbide films deposited by plasma-enhanced and conventional magnetron sputtering at various methane flow rates;Ceramics International;2023-08
2. Magnetron sputtered titanium carbide-based coatings: A review of science and technology;Vacuum;2022-03
3. Technical Characteristics and Wear-Resistant Mechanism of Nano Coatings: A Review;Coatings;2020-03-03
4. Characteristics of carbon‑nickel nanocomposite thin films prepared by reactive sputtering under different radio frequency powers and their applications for electronic devices;Thin Solid Films;2018-05
5. Electrical behavior of nickel/carbon nanocomposite thin films;Carbon;2017-01
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