Source/drain technologies for the scaling of nanoscale CMOS device-Reference-Cited by-同舟云学术

Source/drain technologies for the scaling of nanoscale CMOS device

Published:2011-02 Issue:2 Volume:13 Page:294-305
ISSN:1293-2558
Container-title:Solid State Sciences
language:en
Short-container-title:Solid State Sciences

Author:

Song Yi,Zhou Huajie,Xu Qiuxia

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference78 articles.

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