Author:
Luo Jian-Shing,Lin Wen-Tai,Chang C.Y,Shih P.S,Pan F.M,Chang T.C
Subject
Condensed Matter Physics,General Materials Science
Cited by
2 articles.
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1. Interfacial reactions of Ni/Si0.76Ge0.24 and Ni/Si1−x−yGexCy by vacuum annealing and pulsed KrF laser annealing;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-06
2. Annealing effects on the interfacial reactions of Ni on Si0.76Ge0.24 and Si1−x−yGexCy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-01