Author:
Felch S.B.,Lee B.S.,Daryanani S.L.,Downey D.F.,Matyi R.J.
Subject
Condensed Matter Physics,General Materials Science
Reference7 articles.
1. The National Technology Roadmap for Semiconductors, Semiconductor Industry Association, San Jose, 1994, p. 118.
2. Proc. 9th International Conference on Ion Implantation Technology;Felch,1993
3. Characteristics of a plasma doping system for semiconductor device fabrication
4. Study of gate oxide damage in an electron cyclotron resonance argon plasma
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