Organofluorosilicate glass: A dense low-k dielectric with superior materials properties-Reference-Cited by-同舟云学术

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Organofluorosilicate glass: A dense low-k dielectric with superior materials properties

Published:2008-02 Issue:2-3 Volume:69 Page:518-522
ISSN:0022-3697
Container-title:Journal of Physics and Chemistry of Solids
language:en
Short-container-title:Journal of Physics and Chemistry of Solids

Author:

Cheng Y.L.,Wang Y.L.,Juang Yungder,O’Neill M.L.,Lukas A.S.,Karwacki E.J.,McGuian S.A.,Tang Allen,Wu C.L.

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference8 articles.

1. Intermetal Dielectric Gap Fill by Plasma Enhanced Chemical Vapor Deposited Fluorine-Doped Silicon Dioxide Films

2. Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition

3. Analysis of structural changes in plasma-deposited fluorinated silicon dioxide films caused by fluorine incorporation using ring-statistics based mechanism

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparative study of low dielectric constant material deposited using different precursors;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2011-07

2. Comparative Study of Low Dielectric Constant Material Deposited Using Different Precursors;Advanced Materials Research;2011-05

3. Trimming Nanostructured Walls While Fluorinating their Surfaces: A Route to Making and Widening Pores of Nanoporous Materials and Efficient Catalysts;Chemistry of Materials;2010-08-05

4. Effect of fluorine flow and deposition temperature on physical characteristics and stability of fluorine-doped siloxane-based low-dielectric-constant material;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2010-05

5. Latex-templated porous silica films for antireflective applications;SPIE Proceedings;2010-04-30

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