Spectroscopic applications of structures produced by orientation-dependent etching-Reference-Cited by-同舟云学术

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Spectroscopic applications of structures produced by orientation-dependent etching

Published:1980-05 Issue:1-2 Volume:172 Page:321-326
ISSN:0029-554X
Container-title:Nuclear Instruments and Methods
language:en
Short-container-title:Nuclear Instruments and Methods

Author:

Nagel D.J.,Bean K.E.,Watts R.K.

Publisher

Elsevier BV

Subject

General Medicine

Reference17 articles.

1. Anisotropic etching of silicon

2. Fabrication of novel three-dimensional microstructures by the anisotropic etching of

3. Vertical Etching of Silicon at very High Aspect Ratios

4. R.N. Thomas, (Westinghouse) unpublished.

5. D.J. Coleman and K.E. Bean, (Texas Instruments) unpublished.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Light trapping in plasmonic nanocavities on metal surfaces;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11

2. Micromechanics: A silicon microfabrication technology;Microelectronic Engineering;1985-12

3. Wavelength demultiplexer: using echelette gratings on silicon substrate;Applied Optics;1985-04-01

4. Orientation dependent reactive ion etching of GaAs in SiCl4;Applied Physics Letters;1984-10-15

5. Crystallographic etching of GaAs with bromine and chlorine plasmas;Journal of Applied Physics;1983-10

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