A plasma ion source with plane beam profile for UHV-SIMS measurements
Author:
Publisher
Elsevier BV
Subject
General Medicine
Reference16 articles.
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4. A Magnetic Ion Source
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Pressure dependence of secondary ion emission from selected 3d, 4d, and 5d transition metals under N 2 O, NO, and NO 2;Fresenius' Journal of Analytical Chemistry;1998-10-05
2. Emission of secondary ions from 3d, 4d, and 5d transition metals under chloro-trifluoro-methane CClF 3 as reactant gas;Fresenius' Journal of Analytical Chemistry;1998-07-06
3. A boundary for reaction mechanisms within the transition metals interacting with nitrogen oxides is observed in DSIMS experiments;Fresenius' Journal of Analytical Chemistry;1993
4. Pressure dependence of secondary ion emission from selected transition metals under nitrogen dioxide;Mikrochimica Acta;1991-09
5. Influence of the primary ion incidence angle on secondary ion emission in SIMS with nitric oxide as reactant gas;Fresenius' Journal of Analytical Chemistry;1991
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